NSF Center
for Nano and Micro-
contamination Control

Egan Research Center

Northeastern University
360 Huntington Avenue
Boston, MA 02115

phone: 617.373.6012
fax: 617.373.3266


Monday, November 3, 2008

8:30-9:00am Registration and Breakfast
Raytheon Amphitheater, 240 Egan Research Center, Northeastern University
9:00-9:15am Welcome – Ahmed Busnaina
9:15-9:45am Stephen Beaudoin, Purdue University
Nano and Microparticle Adhesion
9:45-10:15am Takashi Hattori, Hanyang University
Stripping and Cleaning of High-Dose Ion Implanted Photoresists Using a Single-Wafer, Single Chamber, Dry/wet Hybrid
10:15-10:45am Abbas Rasteger, Sematech
Surface Cleaning of EUV Reticles
10:45-11:05am Break
11:05-11:35am Dongsik Kim, Postech University
Analysis of the Laser Shock Cleaning Process for Nanoscale Particle Removal
11:35-12:05am Taehoon Kim, Northeastern University
Nanoparticle Removal with Refined Wet Laser-Induced Shockwave Cleaning
12:05-1:05pm Lunch
1:05-1:35pm Laura Mauer, Solid State Equipment Corporation
Beyond Brush Scrubbing for Particle Removal
1:35-2:05pm Rakesh Singh, Entegris Corp.
New Development in Performance Characterization of Post CMP Cleaning Consumables
2:05-2:35pm Jingoo Park, Hanyang University
Effect of Additives on Post Ru CMP Cleaning and Dispersion Stability of Ru CMP Slurry
2:35-2:55pm Break
2:55-3:25pm Hong Liang, Texas A&M University
Surfactant Concentration and Post-CMP Cleaning
3:25-3:55pm Pegah Karimi, Northeastern University
Removal of Nanoparticles from Submicron Trenches
3:55-4:25pm H.S. Sohn, Akrion Systems
Simultaneous Removal of Particles from Front and Backsides by A Single Wafer Backside Megasonic System
4:25-5:00pm Lab Tour of Kostas Facility for Micro and Nanofabrication
5:00-7:00pm Reception in Raytheon Amphitheatre


Tuesday, November 4, 2008

8:30-9:00am Registration and Breakfast
Raytheon Amphitheater, 240 Egan Research Center, Northeastern University
9:00-9:30 Takeshi Hattori, Sony
Survey of Semiconductor Cleaning Patents Filed in Japan, U.S., Korea, Taiwan, and EU Countries for the Past 10 Years
9:30-10:00am Annie Xia, Entegris
Controlled DI Water Gasification System for Advanced Semiconductor Cleaning Processes
10:00-10:30am Rick Reidy, University of North Texas
Dry Cleaning of Low-K Films
10:30-10:50am Break
10:50-11:20am Anton Duisterwinkel, TNO Science and Industry, Delft, the Netherlands
New Options with Plasma
11:20-11:50am Gerhard Liebel, PVA-TEPLA-AG
High Quality Surface Cleaning and Conditioning for Semiconductor Substrates using Advanced Microwave Plasma Source Technology