Agenda
Monday, November 3, 2008
| 8:30-9:00am | Registration and Breakfast Raytheon Amphitheater, 240 Egan Research Center, Northeastern University |
| 9:00-9:15am | Welcome – Ahmed Busnaina |
| 9:15-9:45am | Stephen Beaudoin, Purdue University Nano and Microparticle Adhesion |
| 9:45-10:15am | Takashi Hattori, Hanyang University Stripping and Cleaning of High-Dose Ion Implanted Photoresists Using a Single-Wafer, Single Chamber, Dry/wet Hybrid |
| 10:15-10:45am | Abbas Rasteger, Sematech Surface Cleaning of EUV Reticles |
| 10:45-11:05am | Break |
| 11:05-11:35am | Dongsik Kim, Postech University Analysis of the Laser Shock Cleaning Process for Nanoscale Particle Removal |
| 11:35-12:05am | Taehoon Kim, Northeastern University Nanoparticle Removal with Refined Wet Laser-Induced Shockwave Cleaning |
| 12:05-1:05pm | Lunch |
| 1:05-1:35pm | Laura Mauer, Solid State Equipment Corporation Beyond Brush Scrubbing for Particle Removal |
| 1:35-2:05pm | Rakesh Singh, Entegris Corp. New Development in Performance Characterization of Post CMP Cleaning Consumables |
| 2:05-2:35pm | Jingoo Park, Hanyang University Effect of Additives on Post Ru CMP Cleaning and Dispersion Stability of Ru CMP Slurry |
| 2:35-2:55pm | Break |
| 2:55-3:25pm | Hong Liang, Texas A&M University Surfactant Concentration and Post-CMP Cleaning |
| 3:25-3:55pm | Pegah Karimi, Northeastern University Removal of Nanoparticles from Submicron Trenches |
| 3:55-4:25pm | H.S. Sohn, Akrion Systems Simultaneous Removal of Particles from Front and Backsides by A Single Wafer Backside Megasonic System |
| 4:25-5:00pm | Lab Tour of Kostas Facility for Micro and Nanofabrication |
| 5:00-7:00pm | Reception in Raytheon Amphitheatre |
Tuesday, November 4, 2008
| 8:30-9:00am | Registration and Breakfast Raytheon Amphitheater, 240 Egan Research Center, Northeastern University |
| 9:00-9:30 | Takeshi Hattori, Sony Survey of Semiconductor Cleaning Patents Filed in Japan, U.S., Korea, Taiwan, and EU Countries for the Past 10 Years |
| 9:30-10:00am | Annie Xia, Entegris Controlled DI Water Gasification System for Advanced Semiconductor Cleaning Processes |
| 10:00-10:30am | Rick Reidy, University of North Texas Dry Cleaning of Low-K Films |
| 10:30-10:50am | Break |
| 10:50-11:20am | Anton Duisterwinkel, TNO Science and Industry, Delft, the Netherlands New Options with Plasma |
| 11:20-11:50am | Gerhard Liebel, PVA-TEPLA-AG High Quality Surface Cleaning and Conditioning for Semiconductor Substrates using Advanced Microwave Plasma Source Technology |