Facilities

Our Facilities: The George J. Kostas Nanoscale Technology and Manufacturing Research Center at Northeastern University

The facility includes a 10,000 square foot cleanroom. Our facility includes a complete six-inch wafer fabrication facility including bulk micromachining, metal surface micromachining and E-beam lithography. It also has a CMP tool (with end point detection), laser surface scanner, Laser airborne and liquid counter (200 nm resolution), CNC particle counters (10 nm resolution), Zeta potential measurement down to 1 nm particles, several cleaning tools, Atomic Force Microscope in addition to optical and FESEM.

• 10,000 square foot cleanroom
• Full six-inch wafer fab
• Nanolithography System (E-beam, AFM) capable of making structures down to 20 nm
• Bulk & metal surface micromachining
• Laser surface scanner (200 nm res.)
• Laser airborne counter (200 nm res.)
• TSI CNC particle counters (2 nm res.)
• PSIA XE150 Atomic Force Microscope
• Nikkon Fluorescence microscope
• Karl Ziess Supra 25 FESEM with EDS
• Nanoparticle Zeta potential measurements
• Surface energy and contact angle automated measurement
• Zygo Surface Profiler
• CMP tool with end point detection
• Nanoimprint Lithography